大学英语词汇短语释义解析及例句 chemical vapor deposition

大学英语词汇短语释义解析及例句 chemical vapor deposition


释义:

chemical vapor deposition 化学气相沉积;化学汽相淀积

例句:



The methods of preparing diamond films by chemical vapor deposition were reviewed.

评述了金刚石薄膜的化学气相沉积方法。



The carbon nanotubes were synthesized by the heat filament chemical vapor deposition.

研究所用的碳纳米管是用热灯丝化学气相沉积法合成的。



High quality diamond thin films were grown by hot-filament chemical vapor deposition.

采用热丝化学气相沉积生长出优异的金刚石薄膜。



The carbon nanotubes were synthesized by the heat filament chemical vapor deposition (CVD).

实验中所用碳纳米管由化学气相沉积法(CVD)合成。



Carbon nanotubes in experiments were synthesized by hot filament chemical vapor deposition.

所用的碳纳米管是用热灯丝化学气相沉积法合成的。



In this paper, substrate materials of diamond films by chemical vapor deposition are discussed.

讨论了化学气相沉积金刚石薄膜的各种衬底材料。



This paper gives an overview of plasma enhanced chemical vapor deposition used in the solar industry.

本文针对电浆辅助化学气相沉积在太阳能产业上的应用作一概略性的介绍。



Experimental results on amorphous silicon growth by CO2 laser chemical vapor deposition are reported.

本文报道了CO_2激光化学气相沉积非晶硅的实验研究。



The conventional preparing method -chemical vapor deposition (CVD) need a long period and expensive cost.

传统化学气相沉积(CVD)工艺制备周期长,而且成本高。



The hydrogen plasma was excited by the technology of helicon-wave plasma chemical vapor deposition (HWP-CVD).

利用螺旋波等离子体化学气相沉积(HWP - CVD)技术,以氢气为反应气体产生等离子体。



A new kind of silicon oxidic film on aluminum was prepared by chemical vapor deposition (CVD) in ambient pressure.

本研究采用常压化学气相沉积(CVD)的方法在金属铝基底上制备出硅氧化合物陶瓷膜层。



Carbon nanotube films were synthesized on Ni substrate by microwave plasma chemical vapor deposition at low temperature.

以镍片为基板材料,利用微波等离子体化学气相沉积法在低温条件下合成了纳米碳管膜。



Polycrystalline silicon thin films were prepared by hot-filament chemical vapor deposition (HFCVD) on glass at low-temperatures.

采用热丝化学气相沉积法(HFCVD)在普通玻璃衬底上低温沉积多晶硅薄膜。



To produce flexible transistor arrays powerful enough to drive a display, engineers employ a process called chemical vapor deposition.

为了生产强大到可以驱动显示的可弯曲晶体管序列,工程师们使用了一种称为“化学气相沉积”(chemical vapor deposition)的流程。



Recently, chemical vapor deposition (CVD) is gradually used in order to enhance the wear resistance and cutting efficiency of bures.

近年来,化学气相沉积(CVD)法逐渐应用于车针后续处理过程之中,增强了车针的耐磨性和切削效率。

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